Publication Type
Journal Article
Version
acceptedVersion
Publication Date
10-2006
Abstract
Vertically coupled microrings in an all-pass filter configuration are fabricated with a range of waveguide misalignments deliberately introduced into the lithography masks to demonstrate noncritical fabrication requirements. The microrings have a mode-expanded bus design which allows a greatly reduced variation in power coupling coefficient-only 6% for fabrication misalignments as high as 1 mum. This represents a five-fold improvement in fabrication tolerance when compared with conventional designs.
Keywords
passive integration, coupling coefficient, microring resonator, mode-expanded bus waveguide, vertical coupling, wafer bonding, waveguide coupling, waveguide misalignment
Discipline
Physical Sciences and Mathematics
Research Areas
Quantitative Finance
Publication
IEEE Photonic Technology Letters
Volume
18
Issue
20
First Page
2129
Last Page
2131
ISSN
1041-1135
Identifier
10.1109/LPT.2006.883199
Publisher
IEEE
Citation
TEE, Chyng Wen; Williams, K. A.; Penty, R. V.; and White, I. H..
Non-Critical Waveguide Alignment for Vertically-Coupled Microring using a Mode-Expanded Bus Architecture. (2006). IEEE Photonic Technology Letters. 18, (20), 2129-2131.
Available at: https://ink.library.smu.edu.sg/lkcsb_research/3338
Copyright Owner and License
Authors
Creative Commons License
This work is licensed under a Creative Commons Attribution-NonCommercial-No Derivative Works 4.0 International License.
Additional URL
https://doi.org/10.1109/LPT.2006.883199