Non-Critical Waveguide Alignment for Vertically-Coupled Microring using a Mode-Expanded Bus Architecture
Vertically coupled microrings in an all-pass filter configuration are fabricated with a range of waveguide misalignments deliberately introduced into the lithography masks to demonstrate noncritical fabrication requirements. The microrings have a mode-expanded bus design which allows a greatly reduced variation in power coupling coefficient-only 6% for fabrication misalignments as high as 1 mum. This represents a five-fold improvement in fabrication tolerance when compared with conventional designs.
passive integration, coupling coefficient, microring resonator, mode-expanded bus waveguide, vertical coupling, wafer bonding, waveguide coupling, waveguide misalignment
Physical Sciences and Mathematics
IEEE Photonic Technology Letters
TEE, Chyng Wen; Williams, KA; Penty, RV; and White, IH.
Non-Critical Waveguide Alignment for Vertically-Coupled Microring using a Mode-Expanded Bus Architecture. (2006). IEEE Photonic Technology Letters. 18, (20), 2129-2131. Research Collection Lee Kong Chian School Of Business.
Available at: http://ink.library.smu.edu.sg/lkcsb_research/3338